Session | ||
AMT6_Enhanced Process Control
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Presentations | ||
1:45pm - 2:10pm
Invited Paper: A Novel Approach for Wafer level Solder Reflow and Cleaning of Semiconductor Wafer in Silicon Photonics, MEMS and Advanced Packaging AEMtec, Berlin, Germany 2:10pm - 2:35pm
In-situ Measurement of HCOOH, CO2 and H2O Concentrations During Formic Acid Reflow Soldering Bond Pulse GmbH, Germany 2:35pm - 3:00pm
Enhanced Process Control for Dry Etching of Functional TiN Structures on 300 mm Wafer Level. Fraunhofer IZM - ASSID, Moritzburg Germany |