Session | ||
MIP5_Microstructural Properties of Materials for Interconnects
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Presentations | ||
11:00am - 11:25am
Effect of Electromigration on Micro Tensile Test Mechanical Properties and Micro Structure of Pure Copper National Cheng Kung University, Tainan, Taiwan 11:25am - 11:50am
Thermal-Mechanical Analysis of Electroplated Copper for IC Packaging imec, Belgium 11:50am - 12:15pm
Study of Intermetallic Compound Evolution of Pure Sn and SnAg Alloy Solder on Single and Multi-layer Under-bump Materials 1Department of Materials Engineering (MTM), KU Leuven, Leuven, Belgium; 2imec, Leuven, Belgium; 3Qualcomm Technologies, Inc.,San Diego, USA |