Session | ||
AP4_Advances in WLP Technologies I
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Presentations | ||
11:00am - 11:25am
Semi-Additive Fine Pitch RDL Litho-Process Development of 1000nm CD Using low-NA 300mm i-line Stepper IMEC, Belgium 11:25am - 11:50am
Study of Cross-contamination in Multi-chamber PVD Systems used for High-throughput Seed Layer Deposition 1Evatec AG, Truebbach, Switzerland; 2Fraunhofer IZM-ASSID, Moritzburg, Germany 11:50am - 12:15pm
Enhanced Defect Detection with Deep Neural Networks Post Wafer Bonding Fraunhofer ENAS, Chemnitz, Germany |