11:00am - 11:25amSemi-Additive Fine Pitch RDL Litho-Process Development of 1000nm CD Using low-NA 300mm i-line Stepper
Lili Wang, Murat Pak, Nelson Pinho, John Slabbekoorn, Andy Miller, Eric Beyne
IMEC, Belgium
11:25am - 11:50amStudy of Cross-contamination in Multi-chamber PVD Systems used for High-throughput Seed Layer Deposition
Patrik Carazzetti1, Carl Drechsel1, Roland Rettenmeier1, Jürgen Weichart1, Kay Viehweger2, Ewald Strolz1
1Evatec AG, Truebbach, Switzerland; 2Fraunhofer IZM-ASSID, Moritzburg, Germany
11:50am - 12:15pmEnhanced Defect Detection with Deep Neural Networks Post Wafer Bonding
Fiete Stoll, Vikas Dubey, Dirk Wünsch, Frank Roscher, Maik Wiemer
Fraunhofer ENAS, Chemnitz, Germany
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