Session | ||
AP1_Advanced Substrates
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Presentations | ||
2:40pm - 3:05pm
Development of Packaging Technology for 2.xD Advanced Packages; Fine Bump Interconnection, Fine Cu Wiring and Large Package Resonac Corporation, Japan 3:05pm - 3:30pm
Advancing Chiplet Architecture Through Heterogeneous Integration on Laser-processed Glass Substrates LPKF Laser & Electronics SE, Garbsen, Germany 3:30pm - 3:55pm
High Rate and Selective (Deep) Reactive-ion Etching Process for the Formation of High-density Vertical Interconnects into Dielectric Build-up Films 1Evatec AG, Trübbach, Switzerland; 2TU Berlin, Berlin, Germany; 3Fraunhofer IZM, Berlin, Germany |