2:40pm - 3:05pmDevelopment of Packaging Technology for 2.xD Advanced Packages; Fine Bump Interconnection, Fine Cu Wiring and Large Package
Kei Togasaki, Masashi Minami, Dongchul Kang, Sadaaki Katoh
Resonac Corporation, Japan
3:05pm - 3:30pmAdvancing Chiplet Architecture Through Heterogeneous Integration on Laser-processed Glass Substrates
Richard Noack, Nils Anspach, Roman Ostholt, Daniel Dunker, Norbert Ambrosius
LPKF Laser & Electronics SE, Garbsen, Germany
3:30pm - 3:55pmHigh Rate and Selective (Deep) Reactive-ion Etching Process for the Formation of High-density Vertical Interconnects into Dielectric Build-up Films
Ioannis Tsigaras1, Ioannis Alexiou1, Christian Voigt2, Lars Böttcher3, Ewald Strolz1, Roland Rettenmeier1
1Evatec AG, Trübbach, Switzerland; 2TU Berlin, Berlin, Germany; 3Fraunhofer IZM, Berlin, Germany
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