Session | ||
MIP2_Advanced Interconnection Metallurgical Materials and Interconnects
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Presentations | ||
5:00pm - 5:25pm
Tuning of Copper Grain Size for Integration in Hybrid Bonding Applications University at Albany, State University of New York, New York, USA 5:25pm - 5:50pm
Fine Pitch Aluminum Hybrid Bonding at Wafer Level: Overcoming the Challenges in Plating, Passivation and Planarization Fraunhofer ENAS, Chemnitz, Germany 5:50pm - 6:15pm
Surface Activated Bonding for Hybrid and All-metal 3D (AM3D) Interconnect 1Meisei University, Hino, Japan; 2The University of Tokyo Tokyo, Japan |