Session | ||
MIP1_Advanced Material Architectures for Interconnects
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Presentations | ||
2:40pm - 3:05pm
Solid-state Growth Kinetics of Compound Layers in Electroplated Cu-In Layer Systems 1Fraunhofer IZM-ASSID, Moritzburg, Germany; 2TU Dresden, Dresden, Germany 3:05pm - 3:30pm
Superconducting Superlattice Interconnects for Cryogenic Systems 1Univ. Grenoble Alpes, CEA, LETI, Grenoble, France; 2Université Paris-Saclay, CEA, IRFU, Gif-sur-Yvette, France 3:30pm - 3:55pm
Aluminium-Aluminium Wafer Level Thermo Compression Bonding Using Thick Electroplated Aluminium Bonding Frames Fraunhofer ENAS, Chemnitz, Germany |